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MMIC用多层磁膜电感研究

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采用磁控溅射生长磁膜工艺，结合BCB（苯并环丁烯）平坦化技术，首次制作了“金属线圈／磁膜／金属线圈（M／F／M）”和“磁膜／金属线圈／磁膜／金属线圈（F／M／F／M）”两种结构的多层磁膜电感，整个工艺与标准MMIC工艺兼容。在2GHz处，“金属线圈／磁膜／金属线圈”结构电感的电感量为7．5nH，品质因数为7．17，与相同结构同工艺同批次传统单层无磁膜电感相比分别提高了270％和47％；“磁膜／金属线圈／磁膜／金属线圈”结构电感的电感量为9nH，品质因数为5．86，与传统电感相比分别提高了350％和25％。结果表明多层磁膜电感在低频范围（〈5GHz）较传统电感有巨大优势。

The multilayer inductors with magnetic thin film were fabricated by magnetron sputtering and benzocyclobutene （BCB） planar process. The inductors have two structures of the ＂metal coils/ferromagnetic thin film/metal coils （M/F/M）＂ and the ＂ferromagnetic thin film/metal coils/ferromagnetic thin film/metal coils（F/M/F/M）＂. The fabrication process is compatible with the standard MMIC integrated process. Traditional single layer inductors without magnetic thin film were fabricated using the same process, in which the structure parameters were consisent with the multilayer inductor with magnetic thin film. The inductance of the inductor with the structure of...