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基于BL0939的天线效应分析
资料介绍
随着半导体工艺技术的发展,栅的特征尺寸越来越小,然而金属走线却越来越长,这就造成了与之相关的天线效应(PAE)越来越显著。分析在芯片制造过程中产生天线效应的原因,并在此基础上提出了四种消除天线效应的方法。其方法应用于BL0939的后端设计,证明了它的切实可行性。
With the development of semiconductor technology,the characteristic size of the gate is getting smaller and smaller,but the metal alignment is getting longer and longer,which results in the related antenna effect(PAE).More and more significant.Based on the analysis of the causes of antenna effect in chip manufacturing,four methods to eliminate antenna effect are proposed.The method is applied to the back end design of BL0939,which proves its feasibility.
部分文件列表
| 文件名 | 大小 |
| 基于BL0939的天线效应分析.pdf | 820K |
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